At SEMICON West 2008, Cymer, Inc., the market’s leading developer of light sources used to create advanced semiconductor chips, announces its second-generation Gas Lifetime eXtension (GLX2™) control system for the XLA and XLR series light sources. GLX2 further extends the maximum time between light sourc…

http://article.sichinamag.comhttp://article.sichinamag.com/2008-07/2008716114632.htm -- 2008-7-16 0:00:00

Cymer, Inc. (Nasdaq: CYMI)/ Cymer Japan, Ltd.** , the world's leading supplier of light sources used in semiconductor lithography, announced today it has reached a significant multi-unit agreement with Toshiba. Under the agreement, Toshiba will include Cymer's krypton fluoride (KrF) and argon fluoride (ArF) light sources in Tos…

http://article.sichinamag.comhttp://article.sichinamag.com/2008-07/200879110035.htm -- 2008-7-9 0:00:00

http://article.sichinamag.comhttp://article.sichinamag.com/2008-05/200852064615.htm -- 2008-5-5 0:00:00

　　随着半导体设计规则的紧缩，在65nm及更高节点，浸没式光刻和EUV被认为是获得更小节距的可选择方案，出于技术极限和成本的考量，在实现量产上光刻技术面临极大挑战，其中之一来自于光刻光源。Cymer作为光源领域的领先供应商，目前提供DUV…

http://article.sichinamag.comhttp://article.sichinamag.com/2008-05/200852064615.htm -- 2008-5-4 0:00:00

　　XLA400是第五代基于主控振荡功率放大器的光刻光源，是为65纳米技术而夺身打造的。在6 kHz的工作脉冲频率下，输出功率是90 W，并且可以进一步的增大, 设备兼容各种类型的光照条件, 并满足用户对线宽控制的严格要求。利用可变输出功率的优势，设…

http://article.sichinamag.comhttp://article.sichinamag.com/2006-04/2006419121903.htm -- 2006-4-21 0:00:00

XLA400是第五代基于主控振荡功率放大器的光刻光源，是为65纳米技术而夺身打造的. 在6 kHz的工作脉冲频率下,输出功率是90 W，并且可以进一步的增大, 设备兼容各种类型的光照条件, 并满足用户对线宽控制的严格要求。利用可变输出功率的优势,设备使芯片…

http://article.sichinamag.comhttp://article.sichinamag.com/2006-04/200645010805.htm -- 2006-4-5 0:00:00