At SEMICON West 2008, Cymer, Inc., the market’s leading developer of light sources used to create advanced semiconductor chips, announces its second-generation Gas Lifetime eXtension (GLX2™) control system for the XLA and XLR series light sources. GLX2 further extends the maximum time between light sourc…

http://article.sichinamag.comhttp://article.sichinamag.com/2008-07/2008716114632.htm -- 2008-7-16 0:00:00

Cymer, Inc. (Nasdaq: CYMI)/ Cymer Japan, Ltd.** , the world's leading supplier of light sources used in semiconductor lithography, announced today it has reached a significant multi-unit agreement with Toshiba. Under the agreement, Toshiba will include Cymer's krypton fluoride (KrF) and argon fluoride (ArF) light sources in Tos…

http://article.sichinamag.comhttp://article.sichinamag.com/2008-07/200879110035.htm -- 2008-7-9 0:00:00

http://article.sichinamag.comhttp://article.sichinamag.com/2008-05/200852064615.htm -- 2008-5-5 0:00:00

　　随着半导体设计规则的紧缩，在65nm及更高节点，浸没式光刻和EUV被认为是获得更小节距的可选择方案，出于技术极限和成本的考量，在实现量产上光刻技术面临极大挑战，其中之一来自于光刻光源。Cymer作为光源领域的领先供应商，目前提供DUV…

http://article.sichinamag.comhttp://article.sichinamag.com/2008-05/200852064615.htm -- 2008-5-4 0:00:00

Prior to SPIE Advanced Lithography 2008, Cymer, Inc. (Nasdaq:CYMI), the world's leading supplier of light sources used in semiconductor lithography, announced today the shipment of its 100th XLA 6kHz laser − the industry’s first production-worthy light source for 45nm immersion lithography − to a high-volu…

http://article.sichinamag.comhttp://article.sichinamag.com/2008-02/2008228105953.htm -- 2008-2-28 0:00:00

Prior to SPIE Advanced Lithography 2008, Cymer, Inc. (Nasdaq: CYMI), the world's leading supplier of light sources used in semiconductor lithography, announced today the availability of high-performance (HP) upgrades for its XLA 105, XLA 300, and XLA 400 products. The upgrades offer customers better metrology and in…

http://article.sichinamag.comhttp://article.sichinamag.com/2008-02/2008228105016.htm -- 2008-2-28 0:00:00

　　伴随着大量的新闻发布，Cymer公司在SEMICON West 2007期间宣布其在极紫外线（EUV）光刻光源上的成功。光刻设备供应商 ASML已经选择Cymer公司的极紫外线光源用于量产设备，并签署了一份长达多年的多项目协议，计划在2008年底首次供货。 　…

http://article.sichinamag.comhttp://article.sichinamag.com/2007-12/20071216121945.htm -- 2007-12-18 0:00:00

光刻设备光源供应商Cymer Inc.第二季度交出了一份亮眼的财报，该公司结束于6月30日的第二季度营收接近1.23亿美元，净利润达到2500万美元。 光刻设备光源供应商Cymer Inc.第二季度交出了一份亮眼的财报，该公司结束于6月30日的第二季度营收接近1.23亿…

http://article.sichinamag.comhttp://article.sichinamag.com/2007-07/2007731114329.htm -- 2007-7-31 0:00:00

半导体曝光用激光光源大型厂商美国西盟（Cymer）7月17日（美国时间）在“SEMICON West 2007”上宣布，曝光装置大型厂商荷兰ASML在EUV（Extreme UltraViolet，远紫外光）曝光装置的量产用光源上，采用了西盟的LPP（Laser Produced Plasma，激光等离子体…

http://article.sichinamag.comhttp://article.sichinamag.com/2007-07/2007719102902.htm -- 2007-7-19 0:00:00

光刻设备准分子激光光源供应商Cymer, Inc.日前公布了结束于3月31日的2007年第一季度财报。该季度Cymer营收1.267亿美元，净利润2032万美元，毛利为6156万美元，毛利率为48.6%，均低于去年同期和前一季度的水平。公司CEO Bob Akins表示该季度业绩不弱…

http://article.sichinamag.comhttp://article.sichinamag.com/2007-04/2007428094743.htm -- 2007-4-28 0:00:00

光刻设备准分子激光光源供应商Cymer, Inc.日前在SPIE Advanced Lithography 2007上宣布，公司已与领先光刻设备厂商Nikon Corporation（尼康）签署协议，前者革命性产品XLR 500i光源将于近期出货给后者。据悉，XLR 500i是世界上首款用于45nm量产浸没式光刻的…

http://article.sichinamag.comhttp://article.sichinamag.com/2007-03/200731100901.htm -- 2007-3-1 0:00:00

　　XLA100是第一代基于双谐振腔功率放大设计平台的氟化氩(ArF)光源。这种准分子激光器为高数值孔径的扫描式曝光设备提供193 nm波长光源，它在狭窄波段的高能输出确保了光刻工艺在65 nm技术节点的良好表现，并且允许向下延伸实现45 nm的图形尺寸…

http://article.sichinamag.comhttp://article.sichinamag.com/2005-9/200611214305290def.htm -- 2005-9-15 0:00:00

　　面对产能不断增加的压力，EUV(extreme ultraviolet, 超紫外光)光刻技术的光源开发商已不得不做出一些关键性的决定，虽然这一领域的角逐远没有结束。在2004年11月日本宫崎召开的EUVL研讨会上，EUV光源供应商Cymer公司宣布：他们已经决定将LPP( laser…

http://article.sichinamag.comhttp://article.sichinamag.com/2005-2/20061121430513dd85.htm -- 2005-2-24 0:00:00

　　深紫外光光源供应商Cymer公司日前推出一种准分子光源XLA 200，该产品适用于45nm制造工艺节点的沉浸光刻技术。 　　 　　XLA 200是首个该类光源，采用了带氟化氩(ArF)光源的主振荡器功率放大器。该光源允许使用多种ArF沉浸扫描器以满足半导体…

http://article.sichinamag.comhttp://article.sichinamag.com/2004-7/200611214304836660.htm -- 2004-7-20 0:00:00

　　Cymer公司推出ELS-7010型KrF(氟化氪)准分子光源，适用于大批量生产的248nm光刻应用。 ELS-7010工作的脉冲重复频率(PRR)为4kHz，可支持大批量晶圆生产的最高扫描速度。该产品改进的放电室散热效率和优化气流使输出功率达40W，半幅波宽(FWH…

http://article.sichinamag.comhttp://article.sichinamag.com/2004-4/20061121430472c4dd.htm -- 2004-4-7 0:00:00