Täby, Sweden – October 30, 2007 – Micronic Laser Systems AB (OMX Nordic Exchange Stockholm, Nordic list, Mid Cap, Information Technology: MICR), a leading global supplier of laser pattern generators for photomasks, said today it received an order for an advanced Omega series laser pattern generator from a customer in Asia. the system will be used for semiconductor applications. The system is scheduled for delivery in December 2007.
“This order demonstrates the value of Omega systems for volume production, as it comes from a customer with multiple systems already installed,” said Sven Lofquist, president and CEO of Micronic. “Interest in the Omega product line is driven by the large number of photomasks manufactured at the 130 nm technology node and above, and the ongoing retirement of older pattern generation tools.”