BOC Edwards, a leading supplier of vacuum, abatement, chemical management equipment and services to the world’s semiconductor OEMs and fabs, announced today the new family of ATLAS™ gas abatement solutions for semiconductor manufacturers. The ATLAS systems meet the industry’s need for three process-related abatement problems: ATLAS TCS addresses the common CVD gases, ATLAS TPU addresses PFC gases in CVD and etch processes, and ATLAS Kronis addres
ses the low-k CVD gases in next-generation processes. The ATLAS systems will be showcased at SEMICON® China 2007, March 21–23, 2007, at the Shanghai New International Expo Centre in Shanghai, (Booth 4509).
The new ATLAS system consumes half the fuel of previous-generation gas abatement systems, significantly reducing running costs. It features one to six inlets with a number of options, including a temperature management system, and a flow capacity of up to 600slm. It also offers enhanced ease-of-use and is more efficient to maintain.
“The ATLAS system is based on the previous-generation technology that customers worldwide have come to trust for performance, reliability, and safety; yet the ATLAS system offers improvements in operating costs, maintenance requirements and ease of use,” said Jerome Boegner, exhaust gas management product manager (Asia), BOC Edwards. “We’ve taken 12 years of field experience with the TCS, TPU, and Kronis products and have improved them with the family of new ATLAS systems.”
The new ATLAS system retains the same inward-firing Alzeta combustor technology as previous-generation gas abatement products; however the layout has been redesigned to give maintenance engineers easier access. A large, color touch-screen display has also been added, further contributing to ease of use and maintenance of the ATLAS abatement systems. A combination of field-proven combustion abatement and wet scrubbing stages p