High Area Chemical Filter Enables High Flow and Nano-size Particle Retention with Low Pressure Drop
高的区域化学过滤器获得低压降下的高流量和纳米级微粒保持
Entegris, Inc. ，蔚健
·随着CD尺寸的缩小和晶圆面积的增大，过滤面临着进退两难的局面。
·区域薄膜过滤器对流量和粒子保持力的改善。
·QuickChange ATM 过滤器优于ATX过滤器的地方。
·气泡法检测薄膜过滤器 
蔚健博士，现任Entegris公司液体微污染控制部门应用研发负责人，拥有Tufts University的化学博士学位。自从1990年加入Entegris公司（曾是密理博公司的半导体部门），她 直从事半导体行业液体过滤和纯化的应用发展工作。1998年，她加入Corning Inc./Lasertron，专注于III-V和II-VI化合物半导体及光电子的行业，曾任Corning Inc./Lasertron产品和市场总监。2003年，她重新加入Entegris（当时的密科理公司），负责液体微污染控制部门的应用研发工作。
Abstract：The ITRS roadmap describes the continuous reduction of critical particle size that results in a defect. The particle cleanliness of every fluid in contact with the wafer must be improved. However, particle filters with smaller pore size generally have higher pressure drop. Because 300 mm wafers require high chemical flow rates, an improvement must be made in the way chemicals are filtered.
The QuickChange ATM filter has improved the flow of the filter cartridge by increasing the membrane area by 40% without increasing the volume of the filter. Membrane retention has been improved at each rated pore size and a 0.03 mm particle retentive membrane has been developed. The result is that a 0.03 mm retentive filter can replace a 0.05 mm retentive filter without loss of chemical flow.
In this paper, the methods used to characterize the filters are discussed. Data is presented from several semiconductor device manufacturers when improved retention filters are installed. Clear improvement in wafer-based metrics can be seen.
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